HallTech develops a gridless ion-beam physical vapor deposition platform for high-quality, high-throughput deposition of dielectric thin films used in semiconductors, flexible displays, batteries, and solar cells. The technology applies thin layers faster, more precisely, and with up to 10x less energy consumption on fragile or heat-sensitive substrates, eliminating trade-offs between quality and speed. It modifies Hall-effect thruster technology from satellite propulsion into an ion-beam source for industrial PVD processes. Co-founded in 2023 by Olivier Oomen (CEO, ex-ASML semiconductor systems expert) and Andrey Nikipelov (CTO, ex-ASML). The company raised €350k seed funding in September 2024 from Brabant Startup Fund and €60k through ESA BIC Noordwijk participation. Headquartered in Eindhoven, Netherlands, with prototype testing at ESA/ESTEC in Noordwijk.